Chinese scientists discover method to cut defects by 99% with DUV chipmaking equipment, but it destroys EUV pattern fidelity — analyzing photoresist clustering with cryo-ET at 105°C

www.tomshardware.com

Chinese scientists discover method to cut defects by 99% with DUV chipmaking equipment, but it destroys EUV pattern fidelity — analyzing photoresist clustering with cryo-ET at 105°C

www.tomshardware.com

BrikoX@lemmy.zipM to

Hardware@programming.devEnglish · 2 months ago

But chipmakers already know this empirically.

But chipmakers already know this empirically.

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